Technology
The cutting-edge technology behind ORS's thin-film monitoring solutions is unique. ORS has developed highly advanced methods of monitoring the various deposition techniques. Please use the links below to view information on how the technology can be used and the scientific explanations behind it.
>> Find out more about ORS products here
Technology
>> Monitoring thin-film development (pdf 577K)
Explaining the science behind thin-film monitoring.
>> Low noise-to-signal ratio (pdf 238K)
Advantages of achieving low noise-signal ratio.
>> Composition measurements using a multi-wavelength
laser interferometer (pdf 344K)
This paper outlines an approach to determine alloy composition robustly using a laser interferometer.
Application notes
>> In situ monitoring for VCSEL (pdf 332K)
Advantages of live, in situ monitoring for manufacture of VCSEL.
>> Quantifying roughness (pdf 196K)
Advantages of in situ roughness monitoring.
>> In situ thickness monitoring for Quantum Cascade Laser
(pdf 175K)
Advantages of in situ monitoring for manufacturing
Quantum Cascade Laser.
Other published items
>> Live Determination of the Physical Properties of a Thin Film During Deposition. (68K)
>> In-situ reflectance monitoring in MBE. (pdf 152K)
>> Optical Monitoring of MBE Growth of AlN/GaN using Single-Wavelength Laser Interferometry. (pdf 84K)
A Simple Method of Tracking real-time changes in Growth-Rate.
>> In situ Characterisation of Nitride Structures in Real Time. (pdf 56K)
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Y-Systems chooses ORS Ltd- Vigo Systems get great results from ORS II/VI solution
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ORS anounce worldwide agency network
- Conferences
- Semicon Taiwan 2010, September 8-10 2010, Taipei World Trade Center, Taipei, Taiwan
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- Latest products
- EpiREF: Easy to install , laser based in situ reflectance monitor
- EpiEYE: Combines the laser based reflectance of the EpiREF with temperature measurement
- EpiEYE Blue: All the features of the EpiEYE with additional measurements at 405nm
- ORS ARC: A single beam in situ wafer bow measurement tool
- R-Fit Live: Increases reactor up-time and wafer yield
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